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AFRL Materials Researcher Dr. Shin Mou shows off the laboratory’s new Molecular Beam Epitaxy chamber, a highly-specialized piece of equipment enabling the growth of semiconducting materials for a new breed of lighter, smaller, more agile electronics. (U.S. Air Force Photo/Adrienne Kreighbaum)
| Date Taken: | 02.04.2019 |
| Date Posted: | 04.01.2019 13:55 |
| Photo ID: | 5227146 |
| VIRIN: | 190312-F-FX606-001 |
| Resolution: | 6000x4000 |
| Size: | 9.89 MB |
| Location: | WRIGHT-PATTERSON AIR FORCE BASE, OHIO, US |
| Web Views: | 61 |
| Downloads: | 10 |
This work, New AFRL lab capability poised to change the face of high-power electronics [Image 2 of 2], by Holly H Jordan, identified by DVIDS, must comply with the restrictions shown on https://www.dvidshub.net/about/copyright.
New AFRL lab capability poised to change the face of high-power electronics
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